This Division has specialized knowledge and skills in preparing thin films of transparent conducting oxides, transition metal chalcogenides and metal/alloy nitrides, which find extensive applications in opto-electronic, electrochromic, photoelectrochemical and biomedical implant devices. Expertise is available to prepare these thin films using various techniques like vacuum/electron beam evaporation, RF/DC magnetron sputtering, sol-gel spin coating, spray pyrolysis, and pulse and brush plating. Electrochemical and spectral characterization of semiconductor thin films and nano powders are being carried out. Preparation of porous silicon /oxide structures for sensors, photovoltaic and LED applications. Development of low cost materials for DSSC and fabrication of large area cells are the strengths of the Division.